Rothschild, Avner, Technion - Israel Institute of Technology

Rothschild, Avner

Technion - Israel Institute of Technology, Israel

2020 Rank: 90,938

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9 profile views

Overall Rank

Rank in SubField 1

Publications

Citations

Main Field:

Enabling & Strategic Technologies

SubField 1:

Nanoscience & Nanotechnology

SubField 2:

Materials

Rank in SubField 1: 2,559 out of 75,210 Researchers

Data For The Year: 2020

Metrics	Self-Citations Excluded	All
Rank Based on Composite Score	90,938	99,396
Total Cites	972	1,035
H-index	16	16
Hm-index	6	6
Number of Single Authored Papers	0	0
Total Cites to Single Authored Papers	0	0
Number of Single+First Authored Papers	15	15
Total Cites to Single+First Authored Papers	122	127
Number of Single+First+Last Authored Papers	48	48
Total Cites to Single+First+Last Authored Papers	429	471
Composite Score	2	2
Number of Distinct Citing Papers	806	829
Ratio of Total Citations to Distinct Citing Papers	1.21	1.25
Self-Citation Percentage	6.09%

Profile link: https://topscinet.com/scientist_profile/Rothschild,%20Avner/2000/?stype=single_year

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